This resin/paste coater is a fully automatic dispensing machine developed for the semiconductor industry.
A Twin-air dispenser is mounted on WL to perform spiral coating on a wafer, so that it can coat an object with polyimide or resist uniformly. Because the amount of a liquid agent to be used can be reduced significantly by comparison with a conventional spin coater, this machine contributes to carbon neutral. It can support 6 to 12-inch wafers.

CL patterns a dot or a line on a chip mounted on a tray, or its Twin-air dispenser dispenses polyimide, resist or silver paste in a 50- to 100μm area finely in order to form a dam structure.

The resin/paste coater is equipped with devices such as a device for a clean room, an FFU and a suction stage for wafers as standard devices appropriate for the semiconductor industry, so that it can satisfy the request of a device for transporting wafers such as a conveyor and a loader.